0571-26692003
No. 181 Geyazhuang, Xihu District,Hangzhou, Zhejiang, P.R. China
This project builds on key breakthroughs in precisely controlled polymer synthesis and purification technologies to advance the localization of photoresist resin materials for advanced-node lithography.
（1）Advanced-node KrF(248nm)/ArF(193nm)/EUV(13.4nm) lithographic Photoresist Resin Materials
For logic and memory chips at advanced process nodes ranging from 150 nm to 3 nm.
（2）Ultra-pure electronic grade chemicals
Providing ultra-pure G3/G4/G5 electronic chemicals for the ultra-precision electronic materials industry
（1） The only company in China that mass-produces KrF/ArF/EUV photoresist resins.
（2）Achieved, for the first time, ton-scale mass production of advanced-node photoresist resin materials based on living radical polymerization technology.
（3） First in China to successfully synthesize an EUV photoresist based on photoacid covalent bonding technology.
Logic/Memory Chip Manufacturing
